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Ion Implantation and Synthesis of Materials

by M. Nastasi and J.W. Mayer

2006 (270 pages)

ISBN:9783540236740

Presenting the physics and materials science of ion implantation and ion beam modification of materials, this book covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder.

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Ion Implantation and Synthesis of Materials
Preface
Chapter 1	-	General Features and Fundamental Concepts
Chapter 2	-	Particle Interactions
Chapter 3	-	Dynamics of Binary Elastic Collisions
Chapter 4	-	Cross-Section
Chapter 5	-	Ion Stopping
Chapter 6	-	Ion Range and Range Distribution
Chapter 7	-	Displacements and Radiation Damage
Chapter 8	-	Channeling
Chapter 9	-	Doping, Diffusion and Defects in Ion-Implanted Si
Chapter 10	-	Crystallization and Regrowth of Amorphous Si
Chapter 11	-	Si Slicing and Layer Transfer: Ion-Cut
Chapter 12	-	Surface Erosion During Implantation: Sputtering
Chapter 13	-	Ion-Induced Atomic Intermixing at the Interface: Ion Beam Mixing
Chapter 14	-	Application of Ion Implantation Techniques in CMOS Fabrication
Chapter 15	-	Ion Implantation in CMOS Technology: Machine Challenges
Appendix A	-	Table of the Elements
Appendix B	-	Physical Constants, Conversions, and Useful Combinations