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Handbook of Thin Film Deposition Processes and Techniques—Principles, Methods, Equipment and Applications, Second Edition

Handbook of Thin Film Deposition Processes and Techniques: Principles, Methods, Equipment and Applications, Second Edition

by Krishna Seshan (ed)

2002 (993 pages)

ISBN:9780815514428

Including much cutting-edge material, this book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years.

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Handbook of Thin Film Deposition Processes and Techniques—Principles, Methods, Equipment and Applications, Second Edition
Foreword
Preface to the Second Edition
Preface to the First Edition
Recent Changes in the Semiconductor Industry
Chapter 1	-	Deposition Technologies and Applications: Introduction and Overview
Chapter 2	-	Silicon Epitaxy by Chemical Vapor Deposition
Chapter 3	-	Chemical Vapor Deposition of Silicon Dioxide Films
Chapter 4	-	Metal Organic Chemical Vapor Deposition: Technology and Equipment
Chapter 5	-	Feature Scale Modeling
Chapter 6	-	The Role of Metrology and Inspection in Semiconductor Processing
Chapter 7	-	Contamination Control, Defect Detection, and Yield Enhancement in Gigabit Manufacturing
Chapter 8	-	Sputtering and Sputter Deposition
Chapter 9	-	Laser and Electron Beam Assisted Processing
Chapter 10	-	Molecular Beam Epitaxy: Equipment and Practice
Chapter 11	-	Ion Beam Deposition
Chapter 12	-	Chemical Mechanical Polishing
Chapter 13	-	Organic Dielectrics in Multilevel Metallization of Integrated Circuits
Chapter 14	-	Performance, Processing, and Lithography Trends